UHV Technologies, Inc. reveals state of the art R & D systems for nano-materials at nanoTX '06. The Nano-100 serves as a platform allowing the user to perform multiple processes such as PECVD, HFCVD, DC and RF Bias Sputtering, RIE, IBD, Carbon Arc and Thermal Evaporation, ALE and PLD. These systems are designed for R & D, small scale production, specialized processes as well as having the benefits of flexibilty, upgradability, and are affordability.
