NANO-100

Designed for Nano-Materials R&D at Nanotechnology Companies and Universities

Applications include R&D, Small Scale Production, Specialized Processes, MEMs/NEMs.

Affordable

Flexible

Upgradable

Features

2-8 inch wafer capability

12 inch and 14 inch chamber

Industrial PLC and PC based controller

Mechanical and Turbo Pumps

Very small foot print - 24 inch x 30 inch

Load-Locks provision for Cluster Tool capability

Four Process Power Supplies are Standard

Extensive Options for Sources and Fixturing

Processes

Plasma Enchanced CVD (PECVD)

Hot Filament (PECVD)

DC and RF Multi-Source Bias Sputtering

Plasma and Reactive Ion Etching (RIE)

Ion Beam Deposition (IBD)

Carbon Arc and Thermal Evaporation

Atomic Layer Epitaxy (ALE)

Pulsed Laser Deposition (PLD)

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